List of Sputtering Targets for Decorative Coating

views, Updated: 2021-09-15

 

Chromium Sputtering Target

Chromium sputtering targets are widely used in hardware tool coating, decorative coating, and flat display coating. Hardware coating is used in various mechanical and metallurgical applications such as robot tools, turning tools, molds (casting, stamping). The film's thickness is generally 2~10um, and it requires high hardness, low wear, impact resistance, and resistance with thermal shock and high adhesion property. Now, chromium sputtering targets are commonly applied in the glass coating industry. The most important application is the preparation of automotive rearview mirrors. With the increasing requirements of automotive rearview mirrors, many companies have switched from the original aluminizing process to the vacuum sputtering chromium process.

Name	Chromium sputtering target	Product link	https://www.aemdeposition.com/pure-metal-targets/chromium-sputtering-targets.html
Brand	AEM Deposition	Purity	99.5-99.95%
Type	Planar sputtering target, Rotary sputtering target	Size	Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

 

Titanium Sputtering Target

Titanium sputtering targets are commonly used in hardware tool coating, decorative coating, semiconductor components, and flat display coating. It is one of the core materials for preparing integrated circuits, and the required purity is usually over 99.99%.
 

Name	Titanium sputtering target	Product link	https://www.aemdeposition.com/pure-metal-targets/titanium-sputtering-targets.html
Brand	AEM Deposition	Purity	99.9-99.999%
Type	Planar sputtering target, Rotary sputtering target	Size	Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

Zirconium Sputtering Target

Zirconium is a lustrous, grey-white, strong transition metal that resembles Hafnium and, to a lesser extent, Titanium. Zirconium is mainly used as a refractory and opacifier, although small amounts are used as an alloying agent for its strong corrosion resistance. The zirconium sputtering target is widely used in decorating coating, semiconductor, and optical coating areas.
 

Name	Zirconium sputtering target	Product link	https://www.aemdeposition.com/pure-metal-targets/zirconium-sputtering-targets.html
Brand	AEM Deposition	Purity	Zr+ Hf ≥ 99.4%, Zr+ Hf =99.95%, Hf<300ppm/4.5%
Type	Planar sputtering target, Rotary sputtering target	Size	Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

Nickel Sputtering Target

Nickel is a silvery-white lustrous metal with a slight golden tinge. It is widely used in the production of sponge nickel and decorative coatings. Nickel can form a decorative coating on ceramic surfaces or a solder layer in-circuit device fabrication when evaporated in a vacuum. It is often sputtered to create layers in magnetic storage media, fuel cells, and sensors. 
 

Name	Nickel sputtering target	Product link	https://www.aemdeposition.com/pure-metal-targets/nickel-sputtering-targets.html
Brand	AEM Deposition	Purity	99.9%, 99.96%, 99.99%, 99.995%, 99.999%
Type	Planar sputtering target, Rotary sputtering target	Size	Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

Tungsten Sputtering Target

Tungsten has the highest melting point (3422℃, 6192 ℉) of all metals in pure form. It has the lowest vapor pressure (at temperatures above 1650℃, 3000 ℉) and the highest tensile strength. Although Carbon remains stable at higher temperatures than tungsten, carbon sublimes at atmospheric pressure instead of melting, so it has no melting point. Tungsten has the lowest coefficient of thermal expansion of any pure metal. The low thermal expansion and high melting point, and tensile strength of tungsten originate from strong covalent bonds formed between tungsten atoms by the 5d electrons. Alloying small quantities of tungsten with steel dramatically increases its toughness.
 

Name	Tungsten sputtering target	Product link	https://www.aemdeposition.com/pure-metal-targets/tungsten-sputtering-targets.html
Brand	AEM Deposition	Purity	99.95%
Type	Planar sputtering target	Size	Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

Titanium Aluminum Sputtering Target

AEM produces Titanium Aluminum sputtering targets by the advanced hot isostatic pressing process. Titanium aluminum sputtering targets are commonly used in hardware tool coating, decorative coating, semiconductor components, and flat display coating. Due to high ductility (Long service life), high thermal conductivity, and homogeneous microstructure.
 

Name	Titanium aluminum sputtering target	Product link	https://www.aemdeposition.com/alloy-targets/titanium-aluminum-sputtering-targets.html
Brand	AEM Deposition	Purity	99.5-99.9%
Type	Planar sputtering target, Rotary sputtering target	Size	Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

As a sputtering target supplier and manufacturer in China, AEM Deposition provides all kinds of pure metal sputtering targets, alloy sputtering targets, ceramic compound sputtering targets, and other targets. See the following list for details:
 

Pure Metal Sputtering Target	Alloy Sputtering Target	Oxide Sputtering Target	Sulfide Sputtering Target
Selenide Sputtering Target	Boride Sputtering Target	Carbide Sputtering Target	Silicide Sputtering Target
Telluride Sputtering Target	Nitride Sputtering Target	Fluoride Sputtering Target

If you are interested, you can go to the sputtering target product page for more details. You can also email us directly for consultation. E-mail: [email protected].