Sputtering Targets
Evaporation Materials
Evaporation Sources
High Purity Materials
Thin Film Substrates
Crytstal Materials
Sputtering Targets
Material Type | Germanium |
Symbol | Ge (N-type) |
Atomic Weight | 72.63 |
Atomic Number | 32 |
Color/Appearance | Grayish White, Semi-Metallic |
Thermal Conductivity | 60 W/m.K |
Melting Point (°C) | 937 |
Bulk Resistivity | 5-40 ohm-cm |
Coefficient of Thermal Expansion | 6 x 10-6/K |
Theoretical Density (g/cc) | 5.32 |
Dopant | Antimony |
Z Ratio | 0.516 |
Sputter | DC (doped), RF |
Max Power Density* (Watts/Square Inch) |
20 |
Type of Bond | Indium, Elastomer |
Comments | Excellent films from E-beam. |
Germanium Sputtering Targets
Purity: 99.9-99.999%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
We can provide Germanium Sputtering Targets (Ge) of other shapes or sizes according to your needs. Please contact us if there is a need.
We can also provide germanium rods, germanium flakes, germanium particles, germanium blocks, germanium powder, etc.
Cutting-edge Quality: Utilizing state-of-the-art manufacturing technologies, we are committed to delivering high-quality Germanium sputtering targets. Our rigorous testing processes ensure that our targets not only meet but exceed industry standards.
Customer Satisfaction and Trust: With years of dedicated effort, we have earned the trust of countless customers, including being the chosen supplier for Stanford University. Our professional team is dedicated to providing top-notch services, building long-term relationships based on satisfaction and trust.
Global Impact and Accessibility: Serving clients globally, our efficient distribution network ensures prompt deliveries. Wherever you are, accessing our high-quality Germanium sputtering targets is seamless. We provide comprehensive support and guidance throughout the purchasing process, ensuring a seamless experience for our global clientele.
Expert Technical Team: With over a decade of industry experience, our technical team can provide tailored advice based on your specific needs.
The germanium target material prepared through this method allows for the production of targets in various sizes within a specific range, facilitating convenient large-scale manufacturing. Simultaneously, as the crucible body is placed on the support base and rotated during production, oxygen within the germanium target material is eliminated. This process results in targets with a density exceeding 99%, significantly enhancing the overall density of the germanium targets.
Germanium sputtering targets will undergo inspection by the quality and technical supervision department to ensure that the product quality complies with the specified standards or the terms outlined in the purchase order (contract).
Items | Test Methods |
---|---|
Ingredient | Chemical Titration |
Purity | ICP |
Relative Density | Archimedes Drainage Method |
Size | Vernier Caliper |
Weight | High Precision Balance |
Fit Position | Caliper |
Fit Rate | Ultrasonic Testing |
Bend | Feeler Gauge |
Fitting Gap | Vernier Caliper |
ICP analyzer
Laser particle size analyzer
Ultrasonic flaw detector
Powder tester
Nitrogen adsorption instrument
We offer target bonding on backing plates using indium-, elastomer-, aluminum- and silver-based metallic alloy to improve thermal conductivity under high power inputs. Durable target bonding requires a variety of pre and post bond functions to assure adhesion.
The picture only show packaging.
The product is vacuum sealed in an anti-static plastic bag and placed in a collision-proof packaging box.
Each product is attached with a label, indicating: product name, purity, specifications, net weight, batch number, production date, supplier name, manufacturer address
During the transportation of the product, prevent bumps and scratches, prevent the product from being damaged and contaminated, and ensure that the target material is intact during transportation.
The product will be stored in a clean and dry environment.
Pure Metal Sputtering Targets | |
Alloy Sputtering Targets | N/A |
Ceramic Sputtering Targets | |
Evaporation Materials | |
Crucibles | N/A |
Metal Powders | N/A |
Germanium sputtering targets serve as fundamental components across various industries, including semiconductor manufacturing, optical coatings, and infrared optics. Whether seeking germanium targets for specific research endeavors or evaluating their market potential, this comprehensive guide offers invaluable insights to guide informed decision-making.
Ge sputtering targets are critical materials used in thin-film deposition processes. Ge (germanium) sputtering targets are fabricated from highly pure germanium material and possess a semi-metallic appearance in a grayish-white hue. With a density of 5.35g/cm³ and a melting point of 937°C, they are commonly employed in the production of transistors and integrated circuits. Typically, they are evaporated under vacuum conditions to form layers in optical storage media and optical coatings. Additionally, this material finds application as an alloying agent and catalyst.
Pure germanium is a semiconductor that looks similar to the element silicon. Germanium, like silicon, naturally reacts with oxygen in nature and forms complexes. But unlike silicon, it is too reactive to be found naturally in a free (elementary) state on Earth.
Germanium sputtering targets exhibit multiple characteristics, including:
Optical Coatings: Germanium sputtering targets are utilized in producing coatings with specific optical properties, such as anti-reflective coatings and reflective mirror coatings. These coatings find significant applications in optical devices, laser systems, and optical fiber communications.
Solar Cells: Germanium targets are also used in the manufacturing of solar cells. The material's high light absorption coefficient and favorable photovoltaic conversion efficiency make it suitable as an absorption layer material in solar cell production.
Other Applications of Metallic Germanium:
Semiconductor Material: Metallic germanium is a crucial semiconductor material used in fabricating semiconductor devices like diodes and transistors. Its high electrical conductivity and excellent thermal conductivity find extensive use in electronic and optoelectronic devices.
Infrared Optical Devices: Metallic germanium plays a vital role in producing infrared optical devices. It exhibits high refractive index, transparency within the infrared spectrum, and good transmission, making it suitable for manufacturing infrared windows, lenses, and reflective mirrors.
Solar Cells: Metallic germanium finds applications in solar cells as a substrate material, contributing to enhanced efficiency and stability in solar cell technology.
Choosing the right supplier for Germanium sputtering targets is an essential decision that significantly impacts thin-film deposition processes' success. To make an informed choice, consider these critical factors:
In Scientific Research: Iridium is frequently used in the preparation of superconducting materials and as a neutron source in nuclear reactions.
AEM is a distinguished manufacturer and reliable source of high quality Germanium sputtering targets. Our comprehensive services ensure precision at every stage from initial selection to timely delivery, making AEM the first choice for quality Germanium sputtering targets requirements. Additionally, in most cases we have the flexibility to create custom samples based on your exact specifications. This ensures you get the exact Germanium sputtering target you need for your specific project. Trust AEM to meet your Germanium sputtering target needs with excellence and customization.
Germanium sputtering targets are usually prepared by processes such as hot press sintering or physical vapor deposition. In hot press sintering, high purity germanium raw material is placed in a crucible and heated to a certain temperature for pressure and heat treatment to form the target. Physical vapor deposition, on the other hand, prepares the target by evaporating germanium material in a vacuum and depositing it on a substrate.
Germanium targets have high purity, usually 99.999% or higher. The material composition is mainly germanium, which ensures excellent electrical and optical properties.
We offer a wide range of germanium targets in various sizes and shapes, which can be customized to specific sizes and shapes according to customers' needs, such as round, square or other special shapes.
Germanium targets have good optical transparency and electrical conductivity, and are suitable for infrared optical devices and semiconductor device preparation. Its optical properties are outstanding in the infrared band and are suitable for infrared lenses and infrared sensors.
Germanium targets are widely used in optical coatings, semiconductor manufacturing, infrared imaging and solar cells, and are key materials for the preparation of thin films and optical devices.
Delivery for small targets is 4-5 weeks. For large targets, the lead time varies based on quantity and material, ranging from 1 to 4 months.
We have a strict quality control process to ensure that our products meet the standards. Meanwhile, we provide perfect after-sales service to ensure customer satisfaction.