List of Sputtering Targets for Tool Coating

views, Updated: 2021-09-13

Titanium Sputtering Target

Titanium sputtering targets are commonly used in hardware tool coating, decorative coating, semiconductor components, and flat display coating. It is one of the core materials for preparing integrated circuits, and purity usually requires over 99.99%. AEM offers Titanium alloy targets such as Tungsten Titanium (W/Ti 90/10 wt%) sputtering target, an essential material for the semiconductor and solar industry. The W/Ti sputtering target density can reach over 14.24 g/cm3, and the purity can reach 99.995%.
 

Name	Titanium sputtering target	Product link	https://www.aemdeposition.com/pure-metal-targets/titanium-sputtering-targets.html
Brand	AEM Deposition	Purity	99.9-99.999%
Type	Planar sputtering target, Rotary sputtering target	Size	Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

Aluminum Sputtering Target

The aluminum sputtering target is widely used in the aerospace, automotive lighting, OLED, and optical industries. Some high purity aluminum targets are used in the semiconductor chip, Flat-panel display, solar cell industries.
 

Name	Aluminum sputtering target	Product link	https://www.aemdeposition.com/pure-metal-targets/aluminum-sputtering-targets.html
Brand	AEM Deposition	Purity	99.99-99.9995%
Type	Planar sputtering target, Rotary sputtering target	Size	Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

Chromium Sputtering Target

Chromium sputtering targets are widely used in hardware tool coating, decorative coating, and flat display coating. Hardware coating is used in various mechanical and metallurgical applications such as robot tools, turning tools, molds (casting, stamping). The film's thickness is generally 2~10um, and it requires high hardness, low wear, impact resistance, and resistance with thermal shock and high adhesion property. Now, chromium sputtering targets are commonly applied in the glass coating industry. The most important application is the preparation of automotive rearview mirrors. With the increasing requirements of automotive rearview mirrors, many companies have switched from the original aluminizing process to the vacuum sputtering chromium process.
 

Name	Chromium sputtering target	Product link	https://www.aemdeposition.com/pure-metal-targets/chromium-sputtering-targets.html
Brand	AEM Deposition	Purity	99.5-99.95%
Type	Planar sputtering target, Rotary sputtering target	Size	Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

Carbon Sputtering Target

Carbon (from Latin: carbo "coal") is a chemical element with the symbol C and atomic number 6. It is nonmetallic and tetravalent-making four electrons available to form covalent chemical bonds. Three isotopes occur naturally, 12C and 13C being stable, while 14C is a radioactive isotope, decaying with a half-life of about 5,730 years. The atoms of carbon can bond together in different ways, termed allotropes of carbon. The best known are graphite, diamond, and amorphous carbon. The physical properties of carbon vary widely with the allotropic form.
 

Name	Carbon sputtering target	Product link	https://www.aemdeposition.com/pure-metal-targets/carbon-sputtering-targets.html
Brand	AEM Deposition	Purity	99.99%-99.999%
Type	Planar sputtering target	Size	Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

Ti Al Sputtering Target

Advanced Engineering Materials produce Titanium Aluminum sputtering targets by the advanced hot isostatic pressing process. Titanium aluminum sputtering targets are commonly used in hardware tool coating, decorative coating, semiconductor components, and flat display coating because of properties like high ductility (Long service life), high thermal conductivity, and homogeneous microstructure.
 

Name	Titanium aluminum sputtering target	Product link	https://www.aemdeposition.com/alloy-targets/titanium-aluminum-sputtering-targets.html
Brand	AEM Deposition	Purity	99.5-99.9%
Type	Planar sputtering target, Rotary sputtering target	Size	Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

Titanium Nitride Sputtering Target

Titanium nitride (TiN) (sometimes known as tinite) is an extremely hard ceramic material, often used as a coating on titanium alloys, steel, carbide, and aluminum components to improve the substrate's surface properties.
 

Name	Titanium nitride sputtering target	Product link	https://www.aemdeposition.com/nitride-targets/titanium-nitride-sputtering-targets.html
Brand	AEM Deposition	Purity	99.5%
Type	Planar sputtering target	Size	Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

Zirconium Nitride Sputtering Target

Zirconium nitride (ZrN) is an inorganic compound used in various ways due to its properties. ZrN grown by physical vapor deposition (PVD) is a light gold color similar to elemental gold. ZrN has a room-temperature electrical resistivity of 12.0 µΩ·cm and a temperature coefficient of resistivity of 5.6·10−8 Ω·cm/K. It has a superconducting transition temperature of 10.4K and a relaxed lattice parameter of 0.4575 nm. The hardness of single-crystal ZrN is 22.7±1.7 GPa, and the elastic modulus is 450 GPa. Zirconium nitride is a hard ceramic material similar to titanium nitride and is a cement-like refractory material. Thus it is used in refractories, cermets, and laboratory crucibles.
 

Name	Zirconium nitride sputtering target	Product link	https://www.aemdeposition.com/nitride-targets/zirconium-nitride-sputtering-targets.html
Brand	AEM Deposition	Purity	99.5%
Type	Planar sputtering target	Size	Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

Titanium Carbide Sputtering Target

Titanium carbide, TiC, is a tough (Mohs 9–9.5) refractory ceramic material, similar to tungsten carbide. It has the appearance of black powder with the sodium chloride (face-centered cubic) crystal structure.  Titanium carbide is used to prepare cermets, which are frequently used to machine steel materials at high cutting speed. It is also used as an abrasion-resistant surface coating on metal parts, such as tool bits and watch mechanisms. Titanium carbide is also used as a heat shield coating for atmospheric reentry of spacecraft.
 

Name	Titanium carbide sputtering target	Product link	https://www.aemdeposition.com/carbide-targets/titanium-carbide-sputtering-targets.html
Brand	AEM Deposition	Purity	99.5%
Type	Planar sputtering target	Size	Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

Chromium Nitride Sputtering Target

Chromium nitride is a chemical compound of chromium and nitrogen with the formula CrN. It is tough and is exceptionally resistant to corrosion. It is an interstitial compound with nitrogen atoms occupying the octahedral holes in the chromium lattice. It is not strictly a chromium(III) compound, nor does it contain nitride ions (N3-). Chromium forms a second interstitial nitride, dichromium nitride, Cr2N.