List of Sputtering Targets for Electronic Device Coating

views, Updated: 2021-09-15

 

 

Nickel Chromium Sputtering Target

Nickel chromium sputtering target can be applied in semiconductor, chemical, vapor deposition (CVD), physical vapor deposition (PVD) display.

Name	Nickel chromium sputtering target	Product link	https://www.aemdeposition.com/alloy-targets/nickel-chromium-sputtering-targets.html
Brand	AEM Deposition	Purity	99.9%
Type	Planar sputtering target	Size	Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

 

Nickel Chromium Silicon Sputtering Target

Nickel chromium silicon sputtering target can be applied in electronic devices, semiconductors, chemicals, vapor deposition (CVD), physical vapor deposition (PVD) display.
 

Name	Nickel chromium aluminum silicon sputtering target	Product link	https://www.aemdeposition.com/alloy-targets/nickel-chromium-aluminum-silicon-sputtering-targets.html
Brand	AEM Deposition	Purity	99.9%
Type	Planar sputtering target	Size	Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

Tantalum Sputtering Target

Tantalum is a dark (blue-gray) metal with high density, good ductile, and highly conductive heat and electricity. Since tantalum can form thin oxides and the film has a protective effect, tantalum is widely used as a base material in the manufacturing process of electrolytic capacitors. Tantalum sputtering targets are applied in microelectronic fields, such as thermal ink-jet print head, copper plating, and through-silicon via technology. Since high-temperature inks can cause cavitation in some ink-jet printing machines, the tantalum sputtering target can be the anti-cavitation films to protect the ink facilities. Some tantalum sputtering targets are also applied in the glass coating.
 

Name	Tantalum sputtering target	Product link	https://www.aemdeposition.com/pure-metal-targets/tantalum-sputtering-targets.html
Brand	AEM Deposition	Purity	99.95%-99.99%
Type	Planar sputtering target, Rotary sputtering target	Size	Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

Nickel Chromium Aluminum Sputtering Target

Nickel chromium aluminum sputtering target can be applied in electronic devices, semiconductors, chemicals, vapor deposition (CVD), physical vapor deposition (PVD) display.
 

Name	Nickel chromium aluminum silicon sputtering target	Product link	https://www.aemdeposition.com/alloy-targets/nickel-chromium-aluminum-silicon-sputtering-targets.html
Brand	AEM Deposition	Purity	99.9%
Type	Planar sputtering target	Size	Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

AEM Deposition, as a sputtering target manufacturer, we provide not only sputtering targets for glass but also sputtering targets for other fields. Such as pure metal sputtering target, alloy sputtering target, ceramic oxide sputtering target and so on. Further details are as follows:
 

Pure Metal Sputtering Target	Alloy Sputtering Target	Oxide Sputtering Target	Sulfide Sputtering Target
Selenide Sputtering Target	Boride Sputtering Target	Carbide Sputtering Target	Silicide Sputtering Target
Telluride Sputtering Target	Nitride Sputtering Target	Fluoride Sputtering Target

If you are interested in any product, you can visit the page by clicking on the relevant link. You are also welcome to approach us via the given email address. E-mail: [email protected].