Evaporation Materials
Evaporation Sources
Sputtering Targets
Crucibles
Thin Film Substrates
High Purity Materials
Crytstal Materials
Powder Products
Pure Metal Targets
Alloy Targets
Oxide Targets
Sulfide Targets
Selenide Targets
Boride Targets
Carbide Targets
Silicide Targets
Telluride Targets
Nitride Targets
Fluoride Targets
Rotary Sputtering Target
Target Bonding
Pure Metal Evaporation Material
Oxide Evaporation Material
Compound Evaporation Material
Alloy Evaporation Material
Boats
Thermal Filaments
Selenium
Tellurium
Bismuth
Germanium
Gallium
Indium
Cadmium
Cobalt
Zinc
Manganese
Iron
Copper
High-temperature Superconducting Thin Film Substrates
Magnetic and Ferroelectricity Film Substrates
Semiconductor Substrates
GaN Thin Film Substrates
Halide Crystal Substrates
Ceramic Substrates
Metal Substrates
Semiconductor Crystals
Scintillation Crystals
Photoelectric Crystals
Infrared Crystals
Laser Crystals
Nonlinear Optical Crystals
Composition: SiO
Purity: 99.9%
Size: ø 42x6mm