List of Sputtering Targets for Low Radiation Building Glass

views, Updated: 2021-09-13

Low-E (low radiation coated glass) building glass, coated with silver film or fluorine-doped tin oxide film on the glass's surface, uses the film to reflect far infrared rays to achieve the purpose of heat insulation and heat preservation. Low radiation building glass has the effects of high visible light transmittance (natural lighting), low reflection (low light pollution), low ultraviolet, and near-infrared transmittance (shading).

 

 

 

 

Name	Silver sputtering target	Product link	https://www.aemdeposition.com/pure-metal-targets/silver-sputtering-targets.html
Brand	AEM Deposition	Purity	99.99%
Type	Planar sputtering target	Size	Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

 

Name	Tin sputtering target	Product link	https://www.aemdeposition.com/pure-metal-targets/tin-sputtering-targets.html
Brand	AEM Deposition	Purity	99.99%
Type	Planar sputtering target	Size	Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

Titanium Sputtering Target

Name	Titanium sputtering target	Product link	https://www.aemdeposition.com/pure-metal-targets/titanium-sputtering-targets.html
Brand	AEM Deposition	Purity	99.9-99.999%
Type	Planar sputtering target, Rotary sputtering target	Size	Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

Zinc Sputtering Target

Zinc is a bluish-white, lustrous, diamagnetic metal, though most common commercial grades of the metal have a dull finish. It is somehow less dense than iron and has a hexagonal crystal structure, with a distorted form of close hexagonal packing. At the same time, each atom has six nearest neighbors (at 265.9 pm) in its plane and six others at a greater distance of 290.6 pm. The metal is hard and brittle at most temperatures but becomes malleable between 100 and 150 ℃. Above 210 ℃, the metal becomes brittle again and can be pulverized by beating. Zinc is a fair conductor of electricity. For a metal, zinc has relatively low melting (419.5 ℃) and boiling points (90).
 

Name	Zinc sputtering target	Product link	https://www.aemdeposition.com/pure-metal-targets/zinc-sputtering-targets.html
Brand	AEM Deposition	Purity	99.99, 99.995%
Type	Planar sputtering target	Size	Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

Silicon Sputtering Target

With a relatively high thermal conductivity of 149 Wm-1K-1, silicon conducts heat well. Silicon sputtering targets mainly used in reactive magnetron sputtering to deposit dielectric layers, such as SiO2 and SiN. As an essential functional film material, they have good hardness, optical, dielectric properties, and wear resistance. Si targets' corrosion resistance has broad application prospects in optical and microelectronics fields and is currently widely used as functional materials globally. Now, it is mainly used for LCD transparent conductive glass, architectural LOW-E glass, and the microelectronics industry. The silicon sputtering targets can be divided into two types: single crystal and polycrystalline. We produce planar silicon sputtering targets through the Czochralski crystal growth method.
 

Name	Silicon sputtering target	Product link	https://www.aemdeposition.com/pure-metal-targets/silicon-sputtering-targets.html
Brand	AEM Deposition	Purity	99.99%, 99.999%
Type	Planar sputtering target, Rotary sputtering target	Size	Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

Chromium Sputtering Target

Chromium sputtering targets are widely used in hardware tool coating, decorative coating, and flat display coating. Hardware coating is used in various mechanical and metallurgical applications such as robot tools, turning tools, molds (casting, stamping). The film's thickness is generally 2~10um, and it requires high hardness, low wear, impact resistance, and resistance with thermal shock and high adhesion property. Now, chromium sputtering targets are commonly applied in the glass coating industry. The most important application is the preparation of automotive rearview mirrors. With the increasing requirements of automotive rearview mirrors, many companies have switched from the original aluminizing process to the vacuum sputtering chromium process.
 

Name	Chromium sputtering target	Product link	https://www.aemdeposition.com/pure-metal-targets/chromium-sputtering-targets.html
Brand	AEM Deposition	Purity	99.5-99.95%
Type	Planar sputtering target, Rotary sputtering target	Size	Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

Niobium Sputtering Target

Niobium is a lustrous, grey, ductile, paramagnetic metal in group 5 of the periodic table (see table), with an electron configuration in the outermost shells atypical for group 5. (This can be observed in the neighborhood of ruthenium (44), rhodium (45), and palladium (46). However, it is thought to have a body-centered cubic crystal structure from T = 0 K to its melting point.  High-resolution measurements of the thermal expansion along the three crystallographic axes reveal anisotropies inconsistent with a cubic structure. Therefore, further research in this area is expected.
 

Name	Niobium sputtering target	Product link	https://www.aemdeposition.com/pure-metal-targets/niobium-sputtering-targets.html
Brand	AEM Deposition	Purity	99.95%
Type	Planar sputtering target, Rotary sputtering target	Size	Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

Nickel Chromium Sputtering Target

Name	Nickel chromium sputtering target	Product link	https://www.aemdeposition.com/alloy-targets/nickel-chromium-sputtering-targets.html
Brand	AEM Deposition	Purity	99.9%
Type	Planar sputtering target	Size	Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

Zinc Tin Sputtering Target

The research describes the electrolytic deposition of Zn, Sn, and Zn/Sn alloys from a metal chloride salts solution separately in Urea and Ethylene glycol/choline chloride-based ionic liquids. It shows that the deposition kinetics and thermodynamics differ from the aqueous processes and that qualitatively different phases, compositions, and morphologies are obtained for the metal coatings in the other ionic liquid systems.
 

Name	Zinc tin sputtering target	Product link	https://www.aemdeposition.com/alloy-targets/zinc-tin-sputtering-targets.html
Brand	AEM Deposition	Purity	99.9%
Type	Planar sputtering target	Size	Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

Niobium Oxide Sputtering Target

Niobium pentoxide is the inorganic compound with the formula Nb2O5. It is a colorless insoluble solid that is relatively unreactive. It is the main precursor to all materials made of niobium. The dominant application is being alloyed. But other specialized applications include capacitors, lithium niobate, and optical glasses.
 

Name	Niobium oxide sputtering target	Product link	https://www.aemdeposition.com/oxide-targets/niobium-oxide-sputtering-targets.html
Brand	AEM Deposition	Purity	99.95%
Type	Planar sputtering target	Size	Circular: Diameter <= 14inch, Block: Length <= 32inch, Width <= 12inch

AEM Deposition provides sputtering targets of different specifications and materials, with purity ranging from 99% to 99.9%, which can be applied to various coating systems. Interested people can directly click the relevant links to visit the corresponding product page. You are welcome to contact us via email for consultation. E-mail: [email protected].