Nickel Chromium Sputtering Target Video
views, Updated: 2021-09-06
Details are as follows:
NiCr 80/20 wt% Sputtering Target
Brand: AEM Deposition
Purity: 99.9%
Size: Φ 54 mm x Φ 43 mm x 20 mm
Tolerance: ± 0.1" on all the dimensions
Applications
- Semiconductor
- Chemical Vapor Deposition (CVD)
- Physical Vapor Deposition (PVD)
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