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  • Gold Pellet Evaporation Material Video

    Gold Pellet Evaporation Material Video

    Date: 2021-09-15

    Abstract: Gold Pellet Evaporation Material.Brand: AEM Deposition.Purity: 99.99%.Diameter: 3 mm.Length: 4 mm.Application:Conductor of heat and electricity;Semiconductors;Sensors;Batteries.

    Application and Introduction of Sputtering Target for Optical Devices

    Application and Introduction of Sputtering Target for Optical Devices

    Date: 2021-09-16

    Abstract: High purity sputtering target mainly refers to the metal or non-metal sputtering target with purity of 99.9% - 99.9999% (3N-6N). It can be used in the fields of integrated circuit, flat panel display, solar cell, magnetic recording media, optical devices, etc. The sputtering target of optical devices is used for optical coating to change the characteristics of light conduction. So what are the sputtering targets for optical devices?

    Application and Introduction of Sputtering Target for Solar Thin Film Battery

    Application and Introduction of Sputtering Target for Solar Thin Film Battery

    Date: 2021-09-17

    Abstract: The sputtering target material for solar thin film battery is the sputtering target material used to form the back electric level of solar thin film battery.

    Application and Introduction of Sputtering Target for Flat Panel Display

    Application and Introduction of Sputtering Target for Flat Panel Display

    Date: 2021-09-17

    Abstract: Sputtering target has a wide range of applications. The industries with a large amount of sputtering targets are mainly concentrated in the fields of integrated circuit, flat panel display, solar cell, magnetic recording media, optical devices, etc.

    Application and Introduction of Sputtering Target for Semiconductor Chip

    Application and Introduction of Sputtering Target for Semiconductor Chip

    Date: 2021-09-17

    Abstract: Semiconductor chips have high technical requirements and high prices for sputtered targets. Their requirements for the purity and technology of sputtered targets are higher than those of flat panel displays, solar cells and other applications. Semiconductor chips set extremely strict standards for the purity of sputtering target metal materials, internal microstructure and other aspects. If the impurity content of sputtering target is too high, the film formed can't meet the electrical performance required by use, and in the sputtering process, it is easy to form particles on the wafer, resulting in short circuit or damage of the circuit, which will seriously affect the performance of the film. Generally speaking, the chip manufacturing requires the highest purity of sputtering target meta

    Application Field of Metal Powder Injection Molding Technology

    Application Field of Metal Powder Injection Molding Technology

    Date: 2021-09-17

    Abstract: Metal powder injection molding technology has the characteristics of high precision, uniform structure, excellent performance and low production cost. It can be widely used in biomedical devices, office equipment, automobile, machinery, hardware, aerospace and other industrial fields. The details are as follows:

    Process and Characteristics of Metal Powder Injection Molding Technology

    Process and Characteristics of Metal Powder Injection Molding Technology

    Date: 2021-09-17

    Abstract: MIM (metal powder injection molding) is a new forming technology of powder metallurgy, which is introduced into the field of powder metallurgy.

    Classification and Introduction of Powder Coatings

    Classification and Introduction of Powder Coatings

    Date: 2021-09-17

    Abstract: how is powder coating classified? Powder coating can be classified according to resin type, coating method, coating function, and coating appearance. Check further details.

    Cerium Hexaboride Sputtering Target Video (CeB6)

    Cerium Hexaboride Sputtering Target Video (CeB6)

    Date: 2021-09-15

    Abstract: Cerium Hexaboride Sputtering Target.Brand: AEM Deposition Purity: 99.5%. Size: Dia 2 inch, THICK 6 mm.

    Lanthanum Hexaboride Sputtering Target Video (LaB6)

    Lanthanum Hexaboride Sputtering Target Video (LaB6)

    Date: 2021-09-17

    Abstract: Lanthanum Hexaboride Sputtering Target.Brand: AEM Deposition.Purity: 99.5%. Size:Dia 2 inch, THICK 6 mm

    Principle and Application of Arc Additive Manufacturing

    Principle and Application of Arc Additive Manufacturing

    Date: 2021-09-17

    Abstract: When it comes to additive manufacturing, we usually think of laser additive manufacturing technology (3D printing) firstly. In fact, there are other types of metal additive manufacturing technology, which can be divided into four categories according to the type of heat source: laser, electron beam, plasma beam and arc; and two categories according to the type of raw materials: metal powder and metal wire.

    Characteristics and Application of Titanium

    Characteristics and Application of Titanium

    Date: 2021-09-20

    Abstract: Titanium is a very light yet very tough and corrosion-resistant metal. It maintains its color for life at room temperature. Know more about the Characteristics and Application of Titanium.