Nickel Chromium Sputtering Targets (Ni/Cr)
Nickel Chromium Sputtering Targets
Nickel Chromium Sputtering Targets
Purity: 99.9%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
NOTE: Ferromagnetic materials require additional consideration while selecting configuration/ thickness. High strength magnets or thinner targets may be necessary. Bonding these materials creates other concerns due to the increase in distance from the magnets. Contact your magnetron sputter cathode supplier or reference your equipment manual for additional information.
More Information on Nickel Chromium Sputtering Targets
Applications• Semiconductor• Chemical Vapor Deposition (CVD) • Physical Vapor Deposition (PVD) |
Features• Competitive pricing• High purity • Grain refined, Engineered microstructure • Semiconductor grade |
Manufacturing Process• RefiningThree-layer electrolytic process • Melting and casting Electrical resistance furnace - Semi-continuous casting • Grain refinement Thermomechanical treatment • Cleaning and final packaging - Cleaned for use in vacuum Protection from environmental contaminants Protection during shipment |
Options• 99.9% minimum purity• Smaller sizes also available for R&D applications • Sputtering target bonding service |
Related Products of Nickel Chromium Sputtering Targets
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Ceramic Sputtering Targets Nickel Oxide Sputtering Target |
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Evaporation Materials Nickel Evaporation Pellet |
Crucibles N/A |
Metal Powders Chromium Powder |
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