Zinc Tin Sputtering Targets (Zn/Sn 52/48 wt%)
| Material Type | Zinc Tin |
| Symbol | Zn / Sn, 52 / 48 wt% |
| Color/Appearance | Metallic solid in various forms |
| Melting Point (°C) | N/A |
| Density | N/A |
| Water Solubility | Insoluble |
| Sputter | |
| Type of Bond | Indium, Elastomer |
| Comments |
Zinc Tin Sputtering Targets
The research describes the electrolytic deposition of Zn, Sn, and Zn/Sn alloys from a metal chloride salts solution separately in Urea and Ethylene glycol/choline chloride-based ionic liquids. It shows that the deposition kinetics and thermodynamics differ from the aqueous processes and that qualitatively different phases, compositions, and morphologies are obtained for the metal coatings in the other ionic liquid systems.
Zinc Tin Sputtering Targets Information
Zinc Tin Sputtering Targets
Purity: 99.9%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
More Information on Zinc Tin Sputtering Targets
Applications• Semiconductor• Chemical Vapor Deposition (CVD) • Physical Vapor Deposition (PVD) |
Features• Competitive pricing• High purity • Grain refined, Engineered microstructure • Semiconductor grade |
Manufacturing Process• RefiningThree-layer electrolytic process • Melting and casting Electrical resistance furnace - Semi-continuous casting • Grain refinement Thermomechanical treatment • Cleaning and final packaging - Cleaned for use in vacuum Protection from environmental contaminants Protection during shipment |
Options• 99.9% minimum purity• Smaller sizes also available for R&D applications • Sputtering target bonding service |
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Evaporation Materials |
Crucibles N/A |
Metal Powders Tin Powder Zinc Powder |
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