Vanadium Carbide Sputtering Targets (VC)
| Material Type | Vanadium Carbide |
| Symbol | VC |
| Melting Point (°C) | 2,810 |
| Theoretical Density (g/cc) | 5.77 |
| Z Ratio | **1.00 |
| Sputter | RF |
| Type of Bond | Indium, Elastomer |
Vanadium Carbide Sputtering Targets
Vanadium carbide is the inorganic compound with the formula VC. It is an extremely hard refractory ceramic material. With a hardness of 9-9.5 Mohs, it is possibly the hardest known metal-carbide. It has an interest because it is prevalent in vanadium metal and alloys. Vanadium Carbide has an elastic modulus of approximately 380 GPa. Vanadium carbide (VC) thin films are deposited on silicon substrates by direct sputtering of a VC target in an argon atmosphere.
Vanadium Carbide Sputtering Targets Information
Vanadium Carbide Sputtering Targets
Purity: 99.5%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
Bonding is recommended for these materials. Many materials have characteristics that are not amenable to sputtering, such as brittleness and low thermal conductivity. This material may require a special ramp up and ramp down procedures. This process may not be necessary for other materials. Targets that have low thermal conductivity are susceptible to thermal shock.
More Information on Vanadium Carbide Sputtering Targets
Applications• Chemical Vapor Deposition (CVD)• Physical Vapor Deposition (PVD) • Semiconductor • Optical |
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.5% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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Related Products of Vanadium Carbon Sputtering Targets
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Ceramic Sputtering Targets |
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Evaporation Materials Vanadium Pellet |
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Metal Powders |
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