Cobalt Oxide Sputtering Targets(CoO)


Material Type | Cobalt Oxide |
Symbol | CoO |
Color/Appearance | Gray or Olive Green, Crystalline Solid |
Melting Point (°C) | 1,795 |
Theoretical Density (g/cc) | 6.45 |
Z Ratio | 0.412 |
Sputter | DC-R, RF-R |
Max Power Density* (Watts/Square Inch) |
18 |
Type of Bond | Indium, Elastomer |
Comments | Sputtering preferred. |
Cobalt Oxide Sputtering Targets
Cobalt Oxide Sputtering Targets
Purity: 99.9%;
Circular: Diameter <= 14 inch, Thickness >= 1 mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1 mm.
More Information on Cobalt Oxide Sputtering Targets
Applications• Ferroelectric• Gate Dielectric • For CMOS
• Non-volatile memory
• Thin film capacitor
|
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.9% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
|
Related Products of Cobalt Oxide Sputtering Targets
Ceramic Sputtering Targets |
||
Evaporation Materials Cobalt Pellet Evaporation Material |
Crucibles N/A |
Metal Powders |



Related Products
FREE QUOTE