Iron Oxide Sputtering Targets (Fe2O3)
| Material Type | Iron (III) Oxide |
| Symbol | Fe2O3 |
| Color/Appearance | Red-Brown, Crystalline Solid |
| Melting Point (°C) | 1,565 |
| Theoretical Density (g/cc) | 5.24 |
| Z Ratio | **1.00 |
| Sputter | RF, RF-R |
|
Max Power Density* (Watts/Square Inch) |
20 |
| Type of Bond | Indium, Elastomer |
| Comments | Disproportionate to Fe3O4 at 1,530°C. |
Iron Oxide Sputtering Targets
Iron oxides are chemical compounds composed of Iron and Oxygen. Altogether, there are sixteen known iron oxides and oxyhydroxides. Iron oxides and oxide-hydroxides are widespread in nature, play an essential role in many geological and biological processes, and are widely used by humans. Some usage examples are iron ores, pigments, catalysts, in thermite (see the diagram) and hemoglobin. Common rust is a form of iron(III) oxide.
Iron Oxide Sputtering Targets Information
Iron Oxide Sputtering Targets
Purity: 99.5% - 99.9%;
Circular: Diameter <= 14 inch, Thickness >= 1 mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1 mm.
More Information on Iron Oxide Sputtering Targets
Applications• Ferroelectric• Gate Dielectric • For CMOS |
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.5% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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Related Products of Iron Oxide Sputtering Targets
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Ceramic Sputtering Targets |
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Evaporation Materials |
Crucibles N/A |
Metal Powders |
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