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Lithium Nickel Manganese Cobalt Oxide Sputtering Target (LiNi0.33Mn0.33Co0.33O2)

Material Type	Lithium Nickel Manganese Cobalt Oxide
Symbol	LiNi0.33Mn0.33Co0.33O2
Color/Appearance	Black, Solid
Melting Point (°C)	N/A

Theoretical Density (g/cc)	4.80
Water Solubility	Insoluble
Sputter	RF, RF-R, DC
Max Power Density* (Watts/Square Inch)	N/A
Type of Bond	Indium, Elastomer
Comments

Lithium Nickel Manganese Cobalt Oxide Sputtering Targets

Lithium nickel manganese cobalt oxide sputtering target, known as NMC sputtering target, is a kind of oxide sputtering target. The chemical formula is LiNi0.33Mn0.33Co0.33O2. It can be used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD), display, and optical applications.

Lithium Nickel Manganese Cobalt Oxide Sputtering Targets Information

Lithium Nickel Manganese Cobalt Oxide Sputtering Targets
Purity: 99.9%;
Circular: Diameter <= 14 inch, Thickness <= 15 mm;
Block: Length <= 120 +/-0.1 mm, Width <= 120 +/-0.1 mm,Thickness <= 15 mm.

More Information on Lithium Nickel Manganese Cobalt Oxide Sputtering Targets

Applications

• Semiconductor

• Chemical Vapor Deposition (CVD)

• Physical Vapor Deposition (PVD)

• Display and optical applications

Features

• High density

• Stoichiometric

• Electrically conductive at room temperature

• Phase pure

Manufacturing Process

• In-house powder synthesis, High purity metal oxide precursor materials, High energy mixing, Particle sizing processes

• Multiple step densification, Proprietary processes employed for pressing and sintering

• Cleaning and final packaging, Cleaned for use in vacuum, Protection from environmental contaminants, Protection during shipment

Options

• 99.9% minimum purity

• Custom compositions may be available upon request

• Smaller sizes also available for R&D applications

• Sputtering target bonding service

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