Magnesium Zinc Oxide Sputtering Targets (Mg(1-x) ZnxO)
| Material Type | Magnesium Zinc Oxide |
| Symbol | Mg(1-x)ZnxO |
| Color/Appearance | White, Solid |
| Melting Point (°C) | N/A |
| Theoretical Density (g/cc) | N/A |
| Water Solubility | Insoluble |
| Sputter | RF, RF-R, DC |
|
Max Power Density* (Watts/Square Inch) |
N/A |
| Type of Bond | Indium, Elastomer |
| Comments |
Magnesium Zinc Oxide Sputtering Target
Magnesium Zinc Oxide Sputtering Targets
Purity: 99.95%;
Circular: Diameter <= 14 inch, Thickness >= 1 mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1 mm.
Other Information of Magnesium Zinc Oxide Sputtering Target
Applications• Ferroelectric• Gate Dielectric • For CMOS |
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options• 99.9% minimum purity•Up to 14'' diameter targets available •Planar tiles up to 8'' X 5'' for larger target configurations |
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