Nickel Oxide Sputtering Targets (NiO)
| Material Type | Nickel Oxide |
| Symbol | NiO |
| Color/Appearance | Green, Crystalline Solid |
| Melting Point (°C) | 1,984 |
| Theoretical Density (g/cc) | 6.67 |
| Z Ratio | **1.00 |
| Sputter | RF-R |
| Type of Bond | Indium, Elastomer |
| Comments | Dissociates on heating. |
Nickel Oxide Sputtering Targets
Nickel(II) oxide is the chemical compound with the formula NiO. It is notable as the only well-characterized nickel oxide (although nickel(III) oxide, Ni2O3, and NiO2 have been claimed). The mineralogical form of NiO, bunsenite, is rare. It is classified as a primary metal oxide. More than a few million kilograms are produced in varying quality annually, mainly as an intermediate in nickel alloys.
Nickel Oxide Sputtering Targets Information
Nickel(II) Oxide Sputtering Targets
Purity: 99.9%;
Circular: Diameter <= 14 inch, Thickness >= 1 mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1 mm.
Bonding is recommended for these materials. Many materials have characteristics that are not amenable to sputtering, such as brittleness and low thermal conductivity. This material may require a special ramp up and ramp down procedures. This process may not be necessary for other materials. Targets that have low thermal conductivity are susceptible to thermal shock.
More Information on Nickel Oxide Sputtering Targets
Applications• Ferroelectric• Gate Dielectric • For CMOS |
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.9% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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Related Products of Nickel Oxide Sputtering Targets
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Ceramic Sputtering Targets |
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Evaporation Materials |
Crucibles N/A |
Metal Powders |
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