Niobium Oxide Sputtering Targets (Nb2Ox)
| Material Type | Niobium Oxide |
| Symbol | Nb2Ox |
| Color/Appearance | Black, Crystalline Solid, Grey-Black |
| Melting Point (°C) | 1,520 |
| Theoretical Density (g/cc) | 4.6 |
| Z Ratio | **1.00 |
| Sputter | RF, RF-R |
| Type of Bond | Indium, Elastomer |
Niobium Oxide Sputtering Targets
Niobium Oxide Sputtering Targets
Purity: 99.95%;
Circular: Diameter <= 14 inch, Thickness >= 1 mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1 mm.
More Information on Niobium Oxide Sputtering Targets
Applications• Ferroelectric• Gate Dielectric • For CMOS |
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.95% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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Related Products of Niobium Oxide Sputtering Targets
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Ceramic Sputtering Targets Niobium Oxide Sputtering Target |
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Evaporation Materials Niobium Evaporation Pellet |
Crucibles N/A |
Metal Powders Niobium Powder |
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