Chromium (Cr) Rotary Sputtering Target
Introduction
Chromium (Cr) Rotary sputtering targets are excellent materials used for Construction Glass coating and and for Decorative Coating that provides superior wear and corrosion resistance.
Changsha Advanced Engineering Materials (AEM) provides high quality rotary chromium rotary sputtering targets produced by Hot Isostatic Pressing (HIP) process, which has a low oxygen content, uniform coating film. The purity of 99.5% and 99.95% rotatable chromium sputtering targets can be produced accroding to customer's requirments.
Specifications
| Materials | Chromium Rotary Sputtering Target |
| Symbol | Cr |
| Purity | 99.5%-99.95% |
| Theoretical Density (g/cc) | 7.2 |
| Melting Point (°C) | 1,857 |
| Production Method | Spraying Type |
| Monolithic Type (HIP) | |
| Size | As per customer's drawings |
| Relative Density | >=95% |
| Grain Sizes | <100 um |
| Production Method | Spraying Type | Monolithic Type (HIP) |
| Oxygen Content (ppm) | 5000 | 800-1500 |
| Film Coating Uniformity | - | High unformity&Density |
| Film Coating Current Density | Unable to work with high current for a long time |
Stable work under High power and long time |
Applications
- Thin Film Photovoltaic Solar Industry
- Flat Panel Display Industry
- Construction / Automotive Glass Industry
- Decorative / Functional Coating Industry
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