Tungsten Disilicide Sputtering Targets (WSi2)
| Material Type | Tungsten Silicide |
| Symbol | WSi2 |
| Melting Point (°C) | 2,165 |
| Theoretical Density (g/cc) | 9.4 |
| Z Ratio | 1.00 |
| Sputter | RF |
|
Max Power Density* (Watts/Square Inch) |
15 |
| Type of Bond | Indium, Elastomer |
Tungsten Disilicide Sputtering Targets
Tungsten silicide (WSi2) is an inorganic compound, a silicide of tungsten. It is an electrically conductive ceramic material. Tungsten silicide can be used in microelectromechanical systems and for oxidation-resistant coatings.
Tungsten Disilicide Sputtering Targets Information
Tungsten Disilicide Sputtering Targets
Purity: 99.5%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
Bonding is recommended for these materials. Many materials have characteristics that are not amenable to sputtering, such as brittleness and low thermal conductivity. This material may require a special ramp up and ramp down procedures. This process may not be necessary for other materials. Targets that have low thermal conductivity are susceptible to thermal shock.
More Information on Tungsten Disilicide Sputtering Targets
Applications
• Chemical Vapor Deposition (CVD) • Optical |
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.5% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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Related Products of Tungsten Disilicide Sputtering Targets
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Ceramic Sputtering Targets Tungsten Oxide Sputtering Target |
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Evaporation Materials Tungsten Evaporation Pellet |
Crucibles Tungsten Crucible Quartz Crucible |
Metal Powders Tungsten Powder |
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