Tin Sulfide Sputtering Targets (SnS)
| Material Type | Tin Sulfide |
| Symbol | SnS |
| Color/Appearance | Dark grey, Solid |
| Melting Point (°C) | 882 |
| Theoretical Density (g/cc) | 5.22 |
| Water Solubility | Insoluble |
| Sputter | RF, RF-R, DC |
| Type of Bond | Indium, Elastomer |
| Comments |
Tin Sulfide Sputtering Targets
Tin Sulfide Sputtering Targets Information
Tin(II) Sulfide Sputtering Targets
Purity: 99.99%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 1.4m( by several pieces construction), Width <= 12 inch, Thickness >= 1mm.
Sulfide sputtering targets such as Tin Sulfide (SnS) are commonly used in electronic industries and produced by the hot press technique.
Tin (II) Sulfide Sputtering Targets Analysis
AEM Deposition manufacture Tin(II) Sulfide sputtering targets with high purity, it’s most important benefits are that your films possess an outstanding level of electrical conductivity and minimized particle formation during the PVD process. The analytical methods we use includes:
1. Metallic elements were analyzed using ICP-OES.
2. Gas elements were analyzed using LECO.
Below form is a Certificate of Analysis (COA) for 99.99% high purity Tin (II) Sulfide Sputtering Target:
More Information on Tin Sulfide Sputtering Targets
Applications• PVD and CVD display• Semiconductor • Optical, solar cell |
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Hot pressed - Sintered, bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum |
Options
• 99.99% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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Related Products of Tin Sulfide Sputtering Targets
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Ceramic Sputtering Targets |
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Evaporation Materials |
Crucibles N/A |
Metal Powders Tin Powder |
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