Hafnium Nitride Sputtering Targets (HfN)
| Material Type | Hafnium Nitride |
| Symbol | HfN |
| Color/Appearance | Yellow-Brown, Crystalline Solid |
| Melting Point (°C) | 3,305 |
| Theoretical Density (g/cc) | 13.8 |
| Z Ratio | **1.00 |
| Sputter | RF, RF-R |
| Type of Bond | Indium, Elastomer |
| Export Control (ECCN) | 1C231 |
Hafnium Nitride Sputtering Targets
Hafnium nitride (HfNx) coatings are prepared via very high rate reactive sputtering in an Ar=N2 atmosphere over a wide range of nitrogen concentrations. The coatings' color varies from a pale yellow at low nitrogen levels to a rich golden yellow color at the higher nitrogen levels. AEM is specialized in producing high purity Hafnium Nitride Sputtering Targets with the highest possible density and smallest possible average grain size.
Hafnium Nitride Sputtering Targets Information
Hafnium Nitride Sputtering Targets
Purity: 99.5%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
Bonding is recommended for these materials. Many materials have characteristics that are not amenable to sputtering, such as brittleness and low thermal conductivity. This material may require a special ramp up and ramp down procedures. This process may not be necessary for other materials. Targets that have low thermal conductivity are susceptible to thermal shock.
More Information on Hafnium Nitride Sputtering Targets
Applications• Chemical Vapor Deposition (CVD)• Physical Vapor Deposition (PVD) • Semiconductor • Optical |
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.5% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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Related Products of Hafnium Nitride Sputtering Targets
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N/A
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Ceramic Sputtering Targets |
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Evaporation Materials |
Crucibles N/A |
Metal Powders |
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