Zirconium Nitride Sputtering Targets (ZrN)
Material Type | Zirconium Nitride |
Symbol | ZrN |
Color/Appearance | Yellow, Crystalline solid |
Melting Point (°C) | 2,980 |
Theoretical Density (g/cc) | 7.09 |
Z Ratio | **1.00 |
Sputter | RF, RF-R |
Type of Bond | Indium, Elastomer |
Export Control (ECCN) | 1C234 |
Comments | Reactively evaporate in 10-3 Torr N2. |
Zirconium Nitride Sputtering Targets
Zirconium Nitride Sputtering Targets Information
Zirconium Nitride Sputtering Targets
Purity: 99.5%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
Bonding is recommended for these materials. Many materials have characteristics that are not amenable to sputtering, such as brittleness and low thermal conductivity. This material may require a special ramp up and ramp down procedures. This process may not be necessary for other materials. Targets that have low thermal conductivity are susceptible to thermal shock.
More Information on Zirconium Nitride Sputtering Targets
Applications• Chemical Vapor Deposition (CVD)• Physical Vapor Deposition (PVD) • Semiconductor • Optical |
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.5% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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Related Products of Zirconium Nitride Sputtering Targets
N/A
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Ceramic Sputtering Targets Zirconium Boride Sputtering Target |
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Evaporation Materials Zirconium Evaporation Pellet |
Crucibles Zirconia Mortars & Pestles |
Metal Powders Zirconium Powder |