Niobium Oxide Sputtering Targets (Nb2Ox)
| Material Type | Niobium Oxide |
| Symbol | Nb2Ox |
| Color/Appearance | Black, Crystalline Solid, Grey-Black |
| Melting Point (°C) | 1,520 |
| Theoretical Density (g/cc) | 4.6 |
| Z Ratio | **1.00 |
| Sputter | RF, RF-R |
| Type of Bond | Indium, Elastomer |
General
Material Notes
Niobium Oxide Sputtering Targets, Purity is 99.95%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.
Other Information of Niobium Oxide Sputtering Targets
|
Applications • Ferroelectric • Gate Dielectric • For CMOS |
Features • High purity • Custom Sizes Available |
|
Manufacturing Process • Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options • 99.9% ex Strontium Minimum Purity • Up to 12'' Diameter Targets Available • Planar Tiles Up to 8'' X 5'' for Larger Target Configurations |
Click for a downloadable datasheet on the Niobium Oxide Sputtering Targets (Nb2Ox)
Can't find the downloadable datasheet you need? Click here to send email to get it.
Click here for answers to some of the most common questions we get asked.
