Ruthenium Oxide Sputtering Targets (RuO2)
| Material Type | Ruthenium Oxide |
| Symbol | RuO2 |
| Color/Appearance | Dark Black, Solid |
| Melting Point (°C) | 1,200 |
| Theoretical Density (g/cc) | 6.97 |
| Water Solubility | Insoluble |
| Sputter | RF, RF-R, DC |
| Type of Bond | Indium, Elastomer |
| Comments |
Ruthenium Oxide Sputtering Targets
Direct current reactive sputtering deposition of ruthenium oxide thin films (bottom and top electrodes) at 400°C are performed to produce a solid-state Thin-Film Supercapacitor (TFSC).
Ruthenium Oxide Sputtering Targets Information
Ruthenium Oxide Sputtering Targets
Purity: 99.9%;
Circular: Diameter <= 14 inch, Thickness >= 1 mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1 mm.
More Information on Ruthenium Oxide Sputtering Targets
Applications• Ferroelectric• Gate Dielectric • For CMOS |
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.9% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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Related Products of Ruthenium Oxide Sputtering Targets
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N/A
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Ceramic Sputtering Targets Ruthenium Oxide Sputtering Target |
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Evaporation Materials Ruthenium Pellet |
Crucibles N/A |
Metal Powders N/A |
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