Terbium Oxide Sputtering Targets (Tb4O7)
| Material Type | Terbium Oxide |
| Symbol | Tb4O7 |
| Color/Appearance | Brown |
| Melting Point (°C) | Decomposes to Tb2O3 |
| Density | 7900 kg/m-3 |
| Molecular Weight | 747.69 |
| Sputter | |
| Exact Mass | 174.92 g/mol |
Terbium Oxide Sputtering Targets
Tb4O7 is most often produced by ignition of the oxalate or the sulfate in the air. The oxalate (at 1000 °C) is generally preferred since the sulfate requires a higher temperature, and it produces an almost black product contaminated with Tb6O11 or other oxygen-rich oxides. AEM can produce high purity Terbium Oxide sputtering targets with the highest possible density and smallest possible average grain size.
Terbium Oxide Sputtering Targets Information
Terbium Oxide Sputtering Targets
Purity: 99.99%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
More Information on Terbium Oxide Sputtering Targets
Applications• Ferroelectric• Chemical Vapor Deposition (CVD) • Physical Vapor Deposition (PVD) • For CMOS |
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.99% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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Related Products of Terbium Oxide Sputtering Targets
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Ceramic Sputtering Targets |
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Evaporation Materials N/A |
Crucibles N/A |
Metal Powders N/A |
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