Titanium Dioxide Sputtering Targets (TiO2)
Material Type | Titanium (IV) Oxide |
Symbol | TiO2 |
Color/Appearance | White-Beige, Gray-Black |
Melting Point (°C) | 1,830 |
Theoretical Density (g/cc) | 4.23 |
Z Ratio | 0.4 |
Sputter | RF, RF-R |
Max Power Density* (Watts/Square Inch) |
20 |
Type of Bond | Indium, Elastomer |
Comments | Suboxide, must be reoxidized to rutile. Ta reduces TiO2 to TiO and Ti. |
Titanium Dioxide Sputtering Targets
Titanium Dioxide Sputtering Targets Information
Titanium Dioxide Sputtering Targets
Purity: 99.99%;
Circular: Diameter <= 14inch, Thickness >= 1mm;
Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm.
Bonding is recommended for these materials. Many materials have characteristics that are not amenable to sputtering, such as brittleness and low thermal conductivity. This material may require a special ramp up and ramp down procedures. This process may not be necessary for other materials. Targets that have low thermal conductivity are susceptible to thermal shock.
More Information on Titanium Dioxide Sputtering Targets
Applications• Decorative coating• Flat panel displays • Low-E glass industry |
Features• High purity and density• Relative density: ≥ 99% • Custom sizes available |
Manufacturing Process• Manufacturing - Hot pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.99% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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Related Products of Titanium Dioxide Sputtering Targets
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Ceramic Sputtering Targets |
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Evaporation Materials Titanium Evaporation Pellet |
Crucibles Intermetallic Crucible (BN-TiB2) |
Metal Powders Titanium Powder Spherical Titanium Powder |