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Copper Telluride Sputtering Targets (Cu2Te)

Material Type	Copper Telluride
Symbol	Cu₂Te
Color/Appearance	Bluish Black, Solid
Melting Point (°C)	N/A

Theoretical Density (g/cc)	7.27
Water Solubility	Insoluble
Sputter	RF, RF-R, DC
Type of Bond	Indium, Elastomer
Comments

Copper Telluride Sputtering Targets

AEM is specialized in producing high purity Copper Telluride Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

Copper Telluride Sputtering Targets Information

Copper Telluride Sputtering Targets
Purity: 99.99%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.

More Information on Copper Telluride Sputtering Targets

Applications

• Semiconductor
• Chemical Vapor Deposition (CVD)
• Physical Vapor Deposition (PVD)

Features

• Competitive pricing
• High purity
• Grain refined, Engineered microstructure
• Semiconductor grade

Manufacturing Process

• Refining
Three-layer electrolytic process
• Melting and casting
Electrical resistance furnace - Semi-continuous casting
• Grain refinement
Thermomechanical treatment
• Cleaning and final packaging - Cleaned for use in vacuum
Protection from environmental contaminants
Protection during shipment

Options

• 99.99% minimum purity

• Smaller sizes also available for R&D applications

• Sputtering target bonding service

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