Hafnium Telluride Sputtering Targets (HfTe2)
| Material Type | Hafnium Telluride |
| Symbol | HfTe2 |
| Color/Appearance | Dark Grey, Solid |
| Melting Point (°C) | N/A |
| Theoretical Density (g/cc) | N/A |
| Water Solubility | Insoluble |
| Sputter | RF, RF-R, DC |
| Type of Bond | Indium, Elastomer |
| Comments |
Hafnium Telluride Sputtering Targets
AEM is specialized in producing high purity Silicon Telluride Sputtering Targets with the highest possible density and smallest possible average grain size to use in applications.
Hafnium Telluride Sputtering Targets Information
Hafnium Telluride Sputtering Targets
Purity: 99.99%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
More Information on Hafnium Telluride Sputtering Targets
Applications• Semiconductor• Chemical Vapor Deposition (CVD) • Physical Vapor Deposition (PVD) |
Features• Competitive pricing• High purity • Grain refined, Engineered microstructure • Semiconductor grade |
Manufacturing Process
• Refining |
Options
• 99.99% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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Related Products of Hafnium Telluride Sputtering Targets
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N/A
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Ceramic Sputtering Targets |
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Evaporation Materials |
Crucibles N/A |
Metal Powders |
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