Tungsten Telluride Sputtering Targets (WTe2)
Material Type | Tungsten Telluride |
Symbol | WTe2 |
Color/Appearance | Dark Grey, Solid |
Melting Point (°C) | 1,020 |
Theoretical Density (g/cc) | 9.43 |
Water Solubility | Insoluble |
Sputter | RF, RF-R, DC |
Type of Bond | Indium, Elastomer |
Comments |
Tungsten Telluride Sputtering Targets
Tungsten(IV) telluride (WTe2) is an inorganic semi-metallic chemical compound. The resistance is proportional to the square of the magnetic field. This may be due to the material being the first example of a compensated semimetal, in which the number of portable holes are the same as the number of electrons. The tungsten ditelluride structure is layered, and the substance can be exfoliated into thin sheets down to monolayers. However, electrons can quickly move between the layers, unlike in other two-dimensional semiconductors. The fraction of charge carriers is 0.005 per formula unit (WTe2).
Tungsten Telluride Sputtering Targets Information
Tungsten Telluride Sputtering Targets
Purity: 99.9%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
More Information on Tungsten Telluride Sputtering Targets
Applications• Semiconductor• Chemical Vapor Deposition (CVD) • Physical Vapor Deposition (PVD) |
Features• Competitive pricing• High purity • Grain refined, Engineered microstructure • Semiconductor grade |
Manufacturing Process
• Refining |
Options
• 99.8% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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