Titanium Carbide Sputtering Targets (TiC)
| Material Type | Titanium Carbide |
| Symbol | TiC |
| Melting Point (°C) | 3,140 |
| Theoretical Density (g/cc) | 4.93 |
| Z Ratio | 1.00 |
| Sputter | RF |
|
Max Power Density* (Watts/Square Inch) |
20 |
| Type of Bond | Indium, Elastomer |
Titanium Carbide Sputtering Targets
Titanium carbide, TiC, is a tough (Mohs 9–9.5) refractory ceramic material, similar to tungsten carbide. It has the appearance of black powder with the sodium chloride (face-centered cubic) crystal structure. Titanium carbide is used to prepare cermets, which are frequently used to machine steel materials at high cutting speed. It is also used as an abrasion-resistant surface coating on metal parts, such as tool bits and watch mechanisms. Titanium carbide is also used as a heat shield coating for atmospheric reentry of spacecraft.
Titanium Carbide Sputtering Targets Information
Titanium Carbide Sputtering Targets
Purity: 99.5%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
Bonding is recommended for these materials. Many materials have characteristics that are not amenable to sputtering, such as brittleness and low thermal conductivity. This material may require a special ramp up and ramp down procedures. This process may not be necessary for other materials. Targets that have low thermal conductivity are susceptible to thermal shock.
More Information on Titanium Carbide Sputtering Targets
Applications
• Chemical Vapor Deposition (CVD) • Optical |
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.5% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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