Boron Nitride Sputtering Targets (BN)
| Material Type | Boron Nitride |
| Symbol | BN |
| Color/Appearance | White, Crystalline Solid |
| Melting Point (°C) | 2,973 |
| Theoretical Density (g/cc) | 2.25 |
| Sputter | RF, RF-R |
|
Max Power Density* (Watts/Square Inch) |
20 |
| Type of Bond | Indium, Elastomer |
| Comments | Decomposes when sputtered. Reactive preferred. |
Boron Nitride Sputtering Targets
Boron nitride is a heat and chemically resistant refractory compound of boron and nitrogen with the chemical formula BN. It exists in various crystalline forms that are isoelectronic to a similarly structured carbon lattice. The hexagonal form corresponding to graphite is the most stable and soft among BN polymorphs and is therefore used as a lubricant and an additive to cosmetic products.
Boron Nitride Sputtering Targets Information
Boron Nitride Sputtering Targets
Purity: 99.5%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
More Information on Boron Nitride Sputtering Targets
Applications• Chemical Vapor Deposition (CVD)• Physical Vapor Deposition (PVD) • Semiconductor • Optical |
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.5% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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Related Products of Boron Nitride Sputtering Targets
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Ceramic Sputtering Targets |
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Evaporation Materials Boron Carbide Pellet |
Crucibles Boron Nitride Crucible |
Metal Powders N/A |
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