Chromium Nitride Sputtering Targets (CrN)
Material Type | Chromium Nitride |
Symbol | CrN, Cr2N |
Color/Appearance | Dark Grey, Solid |
Melting Point (°C) | N/A CrN, 1,800 Cr2N |
Theoretical Density (g/cc) | 5.90 CrN, 6.51 Cr2N |
Water Solubility | Insoluble |
Sputter | RF, RF-R, DC |
Type of Bond | Indium, Elastomer |
Comments |
Chromium Nitride Sputtering Targets
Chromium nitride is a chemical compound of chromium and nitrogen with the formula CrN. It is tough and is exceptionally resistant to corrosion. It is an interstitial compound with nitrogen atoms occupying the octahedral holes in the chromium lattice. It is not strictly a chromium(III) compound, nor does it contain nitride ions (N3-). Chromium forms a second interstitial nitride, dichromium nitride, Cr2N.
Chromium Nitride Sputtering Targets Information
Chromium Nitride Sputtering Targets
Purity: 99.5%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
More Information of Chromium Nitride Sputtering Targets
Applications• Chemical Vapor Deposition (CVD)• Physical Vapor Deposition (PVD) • Semiconductor • Optical |
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.5% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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Related Products of Chromium Nitride Sputtering Targets
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Ceramic Sputtering Targets Chromium Oxide Sputtering Target |
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Evaporation Materials Chromium Evaporation Pellet |
Crucibles N/A |
Metal Powders Chromium Powder |
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