Indium Iron Oxide Sputtering Targets (InFe2O4)


Material Type | Indium Iron Oxide |
Symbol | InFe2O4 |
Color/Appearance | Dark Red, Solid |
Melting Point (°C) | N/A |
Relative Density (g/cc) | N/A |
Z Ratio | N/A |
Sputter | RF, DC |
Max Power Density* (Watts/Square Inch) |
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Type of Bond | Indium, Elastomer |
Comments |
Indium Iron Oxide Sputtering Targets
Indium Iron Oxide Sputtering Targets
Purity: 99.9%;
Circular: Diameter <= 14 inch, Thickness >= 1 mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1 mm.
More Information on Indium Iron Oxide Sputtering Targets
Applications• Ferroelectric• Gate Dielectric • For CMOS |
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.9% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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Related Products of Indium Iron Oxide Sputtering Targets
Ceramic Sputtering Targets |
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Evaporation Materials |
Crucibles N/A |
Metal Powders |



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