Indium Oxide Sputtering Targets (In2O3)
| Material Type | Indium (III) Oxide |
| Symbol | In2O3 |
| Color/Appearance | Yellow, Crystalline Solid |
| Melting Point (°C) | 850 |
| Theoretical Density (g/cc) | 7.18 |
| Z Ratio | **1.00 |
|
Max Power Density* (Watts/Square Inch) |
20 |
| Type of Bond | Indium, Elastomer |
Indium Oxide Sputtering Targets
Indium Oxide Sputtering Targets Information
Indium Oxide Sputtering Targets
Purity: 99.99%;
Circular: Diameter <= 14 inch, Thickness >= 1 mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1 mm.
Bonding is recommended for these materials. Many materials have characteristics that are not amenable to sputtering, such as brittleness and low thermal conductivity. This material may require a special ramp up and ramp down procedures. This process may not be necessary for other materials. Targets that have low thermal conductivity are susceptible to thermal shock.
More Information on Indium Oxide Sputtering Targets
Applications• Transparent conductive flim• Battery
• ITO powder |
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Hot pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.99% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
|
Related Products of Indium Oxide Sputtering Targets
|
Ceramic Sputtering Targets |
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|
Evaporation Materials |
Crucibles N/A |
Metal Powders N/A |
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