Tantalum Oxide Sputtering Targets (Ta2Ox)
| Material Type | Tantalum Oxide |
| Symbol | Ta2Ox |
| Color/Appearance | Black, Solid |
| Melting Point (°C) | 1,872 |
| Theoretical Density (g/cc) | 8.2 |
| Z Ratio | 0.3 |
| Sputter | RF, RF-R |
|
Max Power Density* (Watts/Square Inch) |
20 |
| Type of Bond | Indium, Elastomer |
| Comments | Slight decomposition. Evaporate Ta in 10-3 Torr O2. |
Tantalum Oxide Sputtering Targets
Tantalum pentoxide, also known as tantalum(V) oxide, is the inorganic compound with the formula Ta2O5. It is a white solid that is insoluble in all solvents but is attacked by strong bases and hydrofluoric acid. Ta2O5 is an inert material with a high refractive index and low absorption (i.e., colorless), making it useful for coatings. It is also extensively used in the production of capacitors due to its high dielectric constant.
Tantalum Oxide Sputtering Targets Information
Tantalum Oxide Sputtering Target
Purity: 99.95%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
More Information on Tantalum Oxide Sputtering Targets
Applications• Ferroelectric• Gate Dielectric • For CMOS |
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.95% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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Related Products of Tantalum Oxide Sputtering Targets
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N/A
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Ceramic Sputtering Targets Tantalum Carbide Sputtering Target |
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Evaporation Materials Tantalum Evaporation Pellet |
Crucibles Tantalum Crucible |
Metal Powders Tantalum Powder |
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