Tantalum Oxide Sputtering Targets (Ta2O5)
| Material Type | Tantalum Pentoxide |
| Symbol | Ta2O5 |
| Color/Appearance | White, Crystalline Solid |
| Melting Point (°C) | 1,872 |
| Theoretical Density (g/cc) | 8.2 |
| Z Ratio | 0.3 |
| Sputter | RF, RF-R |
|
Max Power Density* (Watts/Square Inch) |
20 |
| Type of Bond | Indium, Elastomer |
| Comments | Slight decomposition. Evaporate Ta in 10-3 Torr O2. |
Tantalum Oxide Sputtering Targets
Tantalum Oxide Sputtering Targets Information
Tantalum Oxide Sputtering Targets
Purity: 99.95%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
Bonding is recommended for these materials. Many materials have characteristics that are not amenable to sputtering, such as brittleness and low thermal conductivity. This material may require a special ramp up and ramp down procedures. This process may not be necessary for other materials. Targets that have low thermal conductivity are susceptible to thermal shock.
We also have high-quality pure tantalum sputtering targets for sale with 99.95% purity.
More Information on Tantalum Oxide Sputtering Targets
Applications• Ferroelectric• Gate Dielectric • For CMOS |
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.95% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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Related Products of Tantalum Oxide Sputtering Targets
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N/A
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Ceramic Sputtering Targets Tantalum Carbide Sputtering Target |
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Evaporation Materials Tantalum Evaporation Pellet |
Crucibles Tantalum Crucible |
Metal Powders Tantalum Powder |
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