Boron Sputtering Targets (B)
Material Type | Boron |
Symbol | B |
Atomic Weight | 10.811 |
Atomic Number | 5 |
Color/Appearance | Black, Semi-metallic |
Thermal Conductivity | 27 W/m.K |
Melting Point (°C) | 2,079 |
Coefficient of Thermal Expansion | 6 x 10-6/K |
Theoretical Density (g/cc) | 2.34 |
Z Ratio | 0.389 |
Sputter | RF |
Max Power Density* (Watts/Square Inch) |
20 |
Type of Bond | Indium, Elastomer |
Comments | Explodes with rapid cooling. Forms carbide with container. |
Boron Sputtering Targets
Boron is a chemical element with the symbol B and atomic number 5. Produced entirely by cosmic ray spallation and supernovae and not by stellar nucleosynthesis. It is a low-abundance element in the Solar system and the Earth's crust. Boron is concentrated on Earth by the water-solubility of its more common naturally occurring compounds, the borate minerals. These minerals are mined industrially as evaporites, such as Borax and Kernite. The largest known Boron deposits are in Turkey, also the largest producer of boron minerals. Elemental Boron is a metalloid found in small amounts in meteoroids, but chemically uncombined Boron exists naturally on Earth. Industrially, it is challenging to produce pure Boron because of refractory contamination by carbon and other elements.
Boron Sputtering Targets Information
Boron Sputtering Targets
Purity: 99.5%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
More Information on Boron Sputtering Targets
Applications• Electronics• Semiconductor • Flat panel displays |
Features• Competitive pricing• High purity • Grain refined, Engineered microstructure • Semiconductor grade |
Manufacturing Process• RefiningThree-layer electrolytic process • Melting and casting Electrical resistance furnace - Semi-continuous casting • Grain refinement Thermomechanical treatment • Cleaning and final packaging - Cleaned for use in vacuum Protection from environmental contaminants Protection during shipment |
Options• 99.5% minimum purity• Smaller sizes also available for R&D applications • Sputtering target bonding service |
Related Products of Boron Sputtering Targets
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Ceramic Sputtering Targets |
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Evaporation Materials Boron Carbide Pellet |
Crucibles Boron Nitride Crucible |
Metal Powders N/A |
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