Tungsten Carbide Sputtering Targets (WC)
Material Type | Tungsten Carbide |
Symbol | WC |
Melting Point (°C) | 2,860 |
Theoretical Density (g/cc) | 15.63 |
Z Ratio | 0.151 |
Sputter | RF |
Max Power Density* (Watts/Square Inch) |
20 |
Type of Bond | Indium, Elastomer |
Tungsten Carbide Sputtering Targets
Tungsten carbide (chemical formula: WC) is a chemical compound (precisely, a carbide) containing equal parts of tungsten and carbon atoms. In its most basic form, tungsten carbide is a fine gray powder, but it can be pressed and formed into shapes for use in industrial machinery, cutting tools, abrasives, armor-piercing rounds, other tools and instruments, and jewelry. Tungsten carbide (WC) is used for the production of DLC coatings (Diamond-Like Carbon).
Tungsten Carbide Sputtering Targets Information
Tungsten Carbide Sputtering Targets
Purity: 99.95%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
Bonding is recommended for these materials. Many materials have characteristics that are not amenable to sputtering, such as brittleness and low thermal conductivity. This material may require a special ramp up and ramp down procedures. This process may not be necessary for other materials. Targets that have low thermal conductivity are susceptible to thermal shock.
More Information on Tungsten Carbide Sputtering Targets
Applications
• Chemical Vapor Deposition (CVD) • Optical |
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.95% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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