Hafnium Boride Sputtering Targets (HfB2)
Material Type | Hafnium Boride |
Symbol | HfB2 |
Color/Appearance | Dark Grey, Solid |
Melting Point (°C) | 3,150 |
Theoretical Density (g/cc) | 10.50 |
Water Solubility | Insoluble |
Sputter | RF, RF-R, DC |
Type of Bond | Indium, Elastomer |
Comments |
Hafnium Boride Sputtering Targets
Hafnium diboride is an ultrahigh temperature ceramic composed of hafnium and boron. It has a melting temperature of about 3250 degrees Celsius. It is an unusual ceramic, having relatively high thermal and electrical conductivity properties, it shares with isostructural titanium diboride and zirconium diboride. HfB2 is also quite hard and brittle.
Hafnium Boride Sputtering Targets Information
Hafnium Boride Sputtering Targets
Purity: 99.5%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
More Information on Hafnium Boride Sputtering Targets
Applications
• Chemical Vapor Deposition (CVD) • Optical |
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.5% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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