Hafnium Carbide Sputtering Targets (HfC)
| Material Type | Hafnium Carbide |
| Symbol | HfC |
| Melting Point (°C) | ~3,890 |
| Theoretical Density (g/cc) | 12.2 |
| Z Ratio | 1.00 |
| Sputter | RF |
| Type of Bond | Indium, Elastomer |
| Export Control (ECCN) | 1C231 |
Hafnium Carbide Sputtering Targets
Hafnium carbide (HfC) is a chemical compound of hafnium and carbon. With a melting point of about 3900°C, it is one of the most refractory binary compounds known. However, it has low oxidation resistance, with the oxidation starting at temperatures as low as 430°C. Hafnium carbide is usually carbon deficient, and therefore its composition is often expressed as HfCx (x = 0.5 to 1.0). It has a cubic (rock-salt) crystal structure at any value of x.
Hafnium Carbide Sputtering Targets Information
Hafnium Carbide Sputtering Targets
Purity: 99.5%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
Bonding is recommended for these materials. Many materials have characteristics that are not amenable to sputtering, such as brittleness and low thermal conductivity. This material may require a special ramp up and ramp down procedures. This process may not be necessary for other materials. Targets that have low thermal conductivity are susceptible to thermal shock.
More Information on Hafnium Carbide Sputtering Targets
Applications
• Chemical Vapor Deposition (CVD) • Optical |
Features• High purity• Custom sizes available |
Manufacturing Process• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, |
Options
• 99.5% minimum purity
• Smaller sizes also available for R&D applications
• Sputtering target bonding service
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