Hafnium Sputtering Targets (Hf)
Material Type | Hafnium |
Symbol | Hf |
Atomic Weight | 178.49 |
Atomic Number | 72 |
Color/Appearance | Gray Steel, Metallic |
Thermal Conductivity | 23 W/m.K |
Melting Point (°C) | 2,227 |
Coefficient of Thermal Expansion | 5.9 x 10-6/K |
Theoretical Density (g/cc) | 13.31 |
Z Ratio | 0.36 |
Sputter | DC |
Max Power Density* (Watts/Square Inch) |
50 |
Type of Bond | Indium, Elastomer |
Export Control (ECCN) | 1C231 |
Hafnium Sputtering Targets
Hafnium is a chemical element with the symbol Hf and atomic number 72. A lustrous, silvery gray, tetravalent transition metal, hafnium chemically resembles Zirconium and is found in many Zirconium minerals. Its existence was predicted by Dmitri Mendeleev in 1869, though it was not identified until 1923, making it the penultimate stable element to be discovered (Rhenium was identified two years later). Hafnium is named after Hafnia, the Latin name for Copenhagen, where it was discovered.
Hafnium Sputtering Targets Information
Hafnium Sputtering Targets
Purity: Hf+Zr 99.95%;
Circular: Diameter <= 14 inch, Thickness >= 1mm;
Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm.
This is an Export Controlled Material. Restrictions may apply.
More Information on Hafnium Sputtering Targets
Applications• Electronics• Semiconductor • Flat panel displays |
Features• Competitive pricing• High purity • Grain refined, Engineered microstructure • Semiconductor grade |
Manufacturing Process• RefiningThree-layer electrolytic process • Melting and casting Electrical resistance furnace - Semi-continuous casting • Grain refinement Thermomechanical treatment • Cleaning and final packaging - Cleaned for use in vacuum Protection from environmental contaminants Protection during shipment |
Options• 99% minimum purity• Smaller sizes also available for R&D applications • Sputtering target bonding service |
Related Products of Hafnium Sputtering Targets
N/A
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Ceramic Sputtering Targets |
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Evaporation Materials |
Crucibles N/A |
Metal Powders |
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